发明名称 APPARATUS AND METHOD OF ATTACHING A PHOTOMASK WITH PELLICLE
摘要 <p>PURPOSE: A photo-mask and a pellicle attaching apparatus and an attaching method using the same are provided to suppress the distortion of patterns on the photo-mask and increase the holding time of an attached pellicle. CONSTITUTION: A photo-mask(200) is vertically supported by the front side of a first supporter(310). A pellicle is supported by the front side of a second supporter(320) which is parallelly arranged to the first supporter. A tube(330) is arranged to be in contact with the rear side of the first supporter and the second supporter. Fluid fills in the tube in order to apply the pressure of the fluid to the rear side of the first supporter and the rear side of the second supporter.</p>
申请公布号 KR20110077976(A) 申请公布日期 2011.07.07
申请号 KR20090134679 申请日期 2009.12.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JO, SANG JIN
分类号 G03F1/00;H01L21/027 主分类号 G03F1/00
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