METHOD OF PREPARING DRY FILM PHOTORESIST

摘要

PURPOSE: A method for manufacturing a dry film photoresist is provided to perform a light exposure process while a support film is eliminated to prevent bad influences due to the support film, thereby increasing resolution. CONSTITUTION: A resin protection layer is coated on one side of a support film. The support film is dried. A photosensitive resin layer is coated on one side of the resin protection layer. The photosensitive resin layer is dried. A protection film is coated on the photosensitive resin layer.