| 摘要 |
PURPOSE: A compound containing an aromatic ring for a resist underlayer and a resist underlayer composition including the same are provided to ensure excellent optical characteristics, mechanical properties and etching selectivity and to enable the application using a spin-on application technique. CONSTITUTION: A compound containing an aromatic ring for a resist underlayer is represented by chemical formula 1. In chemical formula 1, R1 - R6 are the same or different and represent substituted or unsubstituted C1 - C10 alkyl group, substituted or unsubstituted C5 - C20 aromatic ring, substituted or unsubstituted C3 - C20 cycloalkyl group, or substituted or unsubstituted C3 - C20 cycloalkenyl group; X1 - X6 are hydrogen, -OH, alkylamine or amino group; n1 - n6 are independently 0 - 2; and 1 <= n1+n2+n3+n4+n5+n6 <= 6.
|
