| 摘要 |
PURPOSE: A device for reducing wall energy loss in a substrate processing apparatus is provided to enhance plasma generation capacity by reducing energy loss at a wall. CONSTITUTION: A liner protector(81) is formed in a wall with corners of a chamber. A capacitor(85) is inserted into the hole formed through the wall of the chamber, and electrically connected to a rear side of the liner protector. The chamber includes a chamber body and a lead frame(20) combined with an upper part of the chamber body. The liner protector and the capacitor are installed in the lead frame.
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