| 摘要 |
PURPOSE: A method for metal rework of a metal corrosion generating device is provided to reduce degradation rate and a process loss and to prevent degradation of yield by directly eliminating a corroded metal from a corresponding layer via a rework sequence. CONSTITUTION: A W-CMP(W-Chemical Mechanical Polish) process is performed for forming metal wiring(S100). A metal deposition process is performed and a target material is deposited on a workpiece(S110). The target material is scrubbed via a scrubber(S120). A metal PEP(Photo Engraving Process) is performed(S130). A metal RIE(Reactive Ion Etch) is performed(S140).
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