| 摘要 |
PROBLEM TO BE SOLVED: To uniformize optical characteristics in the whole effective pixel region to improve image quality in a solid-state imaging device. SOLUTION: A back-illuminated CMOS solid-state imaging device includes: a pixel region 23 where a plurality of pixels 24 comprising a photoelectric conversion part PD and a pixel transistor Tr are arrayed; a light-shielding film 39 formed in the pixel region 23; and a planarization film 41 formed immediately above the light-shielding film 39. COPYRIGHT: (C)2011,JPO&INPIT
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