| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask for forming a pattern of a color filter for a liquid crystal display element, specifically, a photomask including an assist pattern inside the main pattern for the purpose of forming a fine pattern. <P>SOLUTION: A fine pattern can be easily produced, although a large photomask is used, by forming an additional pattern inside a photomask window and using reinforcing/compensating interference of light to allow a production of a smaller pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT |
