发明名称
摘要 Raised features are formed on a transparent substrate having absorption of less than about 20% within a processing wavelength range. A portion of the substrate is irradiated with a light beam to increase the absorption of the irradiated portion of the substrate. Continued irradiation causes local heating and expansion of the substrate so as to form a raised feature on the substrate surface.
申请公布号 JP2011519338(A) 申请公布日期 2011.07.07
申请号 JP20110507471 申请日期 2009.05.01
申请人 发明人
分类号 C03C23/00;B23K26/00 主分类号 C03C23/00
代理机构 代理人
主权项
地址