摘要 |
An integrated sensor system for a lithography machine, the system comprising a projection lens system (132) for focusing one or more exposure beams onto a target, a moveable table (134) for carrying the target (9), a capacitive sensing system (300) for making a measurement related to a distance between a final focusing element of the projection lens system (104) and a surface of the target (9), and a control unit (400) for controlling movement of the moveable table (134) to adjust a position of the target (9) based at least in part on a signal from the capacitive sensing system. The capacitive sensing system (300) comprises a plurality of capacitive sensors (30), each comprising a thin film structure. The capacitive sensors and the final focusing element (104) of the projection lens system are mounted directly to a common base (112), and the sensors are located in close proximity to an edge of the final focusing element of the projection lens system. |
申请人 |
MAPPER LITHOGRAPHY IP B.V.;DE BOER, GUIDO;VAN BAAR, JOHNNY JOANNES JACOBUS;PADHYE, KAUSTUBH PRABODH;MOSSEL, ROBERT;VERGEER, NIELS;STEENBRINK, STIJN WILLEM HERMAN KAREL |
发明人 |
DE BOER, GUIDO;VAN BAAR, JOHNNY JOANNES JACOBUS;PADHYE, KAUSTUBH PRABODH;MOSSEL, ROBERT;VERGEER, NIELS;STEENBRINK, STIJN WILLEM HERMAN KAREL |