| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a monomer for producing a resin for additives of a radiation-sensitive resist material having excellent transparency and very few development defects. <P>SOLUTION: The fluorine-containing monomer is represented by general formula (1), wherein R<SP>1</SP>is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R<SP>2</SP>is a 1-15C straight chain, branched, or cyclic monovalent hydrocarbon group which may have a halogen atom or an oxygen atom; A is a 1-6C straight chain, branched, or cyclic bivalent hydrocarbon group; and K<SP>1</SP>is an integer of 0-2. <P>COPYRIGHT: (C)2011,JPO&INPIT |
