发明名称 METHOD AND APPARATUS FOR DRYING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and a method for drying a substrate capable of preventing liquid drops from remaining on the substrate to suppress the generation of a water mark more effectively than Marangoni drying. SOLUTION: The apparatus for drying a substrate cleaned with a diamagnetic liquid includes: a magnet 4 for moving liquid adhered to the substrate by a magnetic force; and a magnet transferring means 5 for moving the magnet 4 toward the edge side of the substrate along the substrate. Moreover, when drying the substrate cleaned with the diamagnetic liquid, the magnet 4 is moved closer to the substrate and the magnet 4 is moved toward the edge side of the substrate along the substrate. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011135009(A) 申请公布日期 2011.07.07
申请号 JP20090295503 申请日期 2009.12.25
申请人 TOKYO ELECTRON LTD 发明人 TAMURA AKITAKE
分类号 H01L21/304;F26B5/00 主分类号 H01L21/304
代理机构 代理人
主权项
地址