SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of suppressing disturbance of an air current between a substrate and an opposite member opposed thereto. SOLUTION: The substrate processing apparatus 1 includes: a spin chuck 3 horizontally holding and rotating a substrate W; a nozzle 5 discharging a processing liquid toward a part of an upper-surface peripheral part of the substrate W; a nozzle rotating mechanism 35 making the nozzle 5 rotate on an axis L2 of rotation; a processing liquid supply mechanism 6 supplying the processing liquid to the nozzle 5; and a shield plate 4 having the opposite surface 26 opposed to the upper surface of the substrate W and a nozzle insertion hole 29 which is opened on the opposite surface 26 and into which the nozzle 5 is inserted. The nozzle 5 has a discharge hole formed on an under surface 5a of the nozzle 5. The discharge hole of the nozzle 5 is disposed apart from the axis L2 of rotation. COPYRIGHT: (C)2011,JPO&INPIT