| 摘要 |
PROBLEM TO BE SOLVED: To optimize an antireflective film under a light-shielding film to improve pixels in a back-illuminated solid-state imaging device. SOLUTION: A back-illuminated solid-state imaging device includes: a pixel region where a plurality of pixels comprising a photoelectric conversion part and a pixel transistor are arrayed; a light-shielding film 39 corresponding to an optical black level region 23B in the pixel region; a first planarization film 52 serving as a substrate of the light-shielding film 39; and an antireflective film 36 serving as a substrate of the first planarization film 52. COPYRIGHT: (C)2011,JPO&INPIT
|
