发明名称 MATERIAL GAS CONCENTRATION CONTROL SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a material gas concentration control system capable of preventing the occurrence of a state such that when a concentration of a material gas is held in a constant state by a certain set concentration, partial pressure of the material gas becomes extremely low, thereby, total pressure corresponding to the partial pressure of the material gas cannot be achieved within a movable range of a valve, and the concentration of the material gas cannot be held constant at the set concentration. <P>SOLUTION: The material gas concentration control system is used for a material vaporization system 100, and includes: a first valve 23 provided on a lead-out pipe 12; a concentration measuring unit CS which measures the concentration of the material gas in a mixed gas; a concentration control unit CC which controls the degree of opening of the first valve 23 so that the measured concentration of the material gas measured by the concentration measuring unit CS reaches the predetermined set concentration; a temperature controller 41 which controls the temperature in a tank so as to be the set temperature; and a temperature setting unit 42 which sets the set temperature of the temperature controller. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011134916(A) 申请公布日期 2011.07.07
申请号 JP20090293533 申请日期 2009.12.24
申请人 HORIBA LTD;HORIBA STEC CO LTD 发明人 MINAMI MASAKAZU;INOUE MASANORI
分类号 H01L21/205;C23C16/448;C23C16/52;H01L21/304;H01L21/31 主分类号 H01L21/205
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