| 摘要 |
PURPOSE: Polymer for a resist sub-layer, a resist sub-layer composition including the same, a method for forming patterns on a device are provided to implement a coating process using a spin-on coating method and improve the optical characteristic, the mechanical characteristic, and the etching selectivity. CONSTITUTION: Polymer for a resist sub-layer includes a repeating unit which is represented by chemical formula 1 or chemical formula 2. In the chemical formulas 1 and 2, the n1 and n2 are between 2 and 100. The A1 and the A2 are respectively one of functional groups represented by chemical formulas 3 to 5. In the chemical formulas 3 to 5, the R1 is substituted or non-substituted cycloalkyl group, substituted or non-substituted aryl group, cycloalkyl group substituted alkyl group, or aryl group substituted alkyl group. The R2 to R4 are respectively hydrogen, hydroxyl group, substituted or non-substituted alkyl group, substituted or non-substituted aryl group, substituted or non-substituted cycloalkyl group, substituted or non-substituted aryl group, or carbonyl group. The n3 to n6 are respectively the integer of 1 to 20. The B is residue derived from one forming an aldehyde compound based on monomer. The D is one of functional groups represented by other chemical formulas. |
