SEMICONDUCTOR MEASURING APPARATUS AND SEMICONDUCTOR MEASURING METHOD

摘要

PURPOSE: Semiconductor measuring device and method are provided to simultaneously measure and analyze light emitting and thickness of an epi-layer throughout an epi-wafer. CONSTITUTION: A semiconductor measuring device comprises a first light source(110), a second light source(120) and a spectrometer. The first light source makes a target emit light. The second light source measures the thickness of the target. The spectrometer measures light emitted from the target by guide of the first light source and reflective light of light incident to the target from the second light source. The second light source has a continuous spectrum of larger wavelength than the light emitted from the target by guide of the first light source.