| 摘要 |
PURPOSE: A method for processing lot of a sequential bath type semiconductor device is provided to reduce cleaning process time by inserting a lot which stands by in an FR process bath to a dry device. CONSTITUTION: A lot cleaned in at least one or more processing baths is inputted to a dry device for a drying process. The lot is transferred to a transfer robot for loading lot on an unloading cassette after the lot is completely dried. If the lot is transferred by the transfer robot, the lot which stands by in a pre-processing bath is inputted to the dry device(S302). The transfer robot is transferred to the dry device according as the standby lot is inputted to the dry device(S304), and a loading cassette is discharged to the outside by using a transfer robot(S306).
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