发明名称 Plasma source for charged particle beam system
摘要 <p>An inductively coupled plasma source (100) for a focused charged particle beam system includes a dielectric liquid (126) that insulates and cools the plasma chamber (102). A flow restrictor (158) at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.</p>
申请公布号 EP2341525(A2) 申请公布日期 2011.07.06
申请号 EP20100196692 申请日期 2010.12.23
申请人 FEI COMPANY 发明人 KELLOG, SEAN;MILLER, TOM;ZHANG, SHOUYIN;GRAUPERA, ANTHONY;MCGINN, JAMES;DIRRIWACHTER, TOM;SMITH, NOEL
分类号 H01J37/02;H01J27/16;H01J37/08 主分类号 H01J37/02
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