发明名称
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a dielectric laminate structure having reduced damage of a dielectric layer, to provide a method of manufacturing a dielectric laminate structure capable of manufacturing such a dielectric laminate structure, and to provide a wiring board provided with such a dielectric laminate structure. <P>SOLUTION: A capacitor 1 is formed by baking a laminate 13 provided with a metal foil 2 having a through-hole 2a, a dielectric layer 11 formed on at least one of main surfaces 2b, 2c of the metal foil 2, and a conductor layer 12 formed on the dielectric layer 11. The through-hole 2a is formed before forming the dielectric layer 12 on at least one of the main surfaces 2b, 2c of the metal foil 2. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP4718314(B2) 申请公布日期 2011.07.06
申请号 JP20050353790 申请日期 2005.12.07
申请人 发明人
分类号 H01G4/30;B32B7/02;B32B15/04;H05K3/46 主分类号 H01G4/30
代理机构 代理人
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