发明名称 PROCESS FOR PRODUCING LAMINATED SUBSTRATE AND LAMINATED SUBSTRATE
摘要 <p>A method of manufacturing a laminated substrate is provided. The method includes: forming an oxide film on at least a surface of a first substrate having a hardness of equal to or more than 150GPa in Young's modulus, and then smoothing the oxide film; implanting hydrogen ions or rare gas ions, or mixed gas ions thereof from a surface of a second substrate to form an ion-implanted layer inside the substrate; laminating the first substrate and the second substrate through at least the oxide film, and then detaching the second substrate in the ion-implanted layer to form a laminated substrate; heat-treating the laminated substrate and diffusing outwardly the oxide film.</p>
申请公布号 EP2128891(A4) 申请公布日期 2011.07.06
申请号 EP20070737557 申请日期 2007.02.28
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 AKIYAMA, SHOJI;ITO, ATSUO;KUBOTA, YOSHIHIRO;TANAKA, KOICHI;KAWAI, MAKOTO;TOBISAKA, YUUJI
分类号 H01L21/02;H01L27/12 主分类号 H01L21/02
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