| 摘要 |
PURPOSE: An apparatus for processing plasma and an electrode used therefor are provided to control the distribution of high frequency electric field strength by forming a plasma generation space. CONSTITUTION: A subject is processed by plasma in a processing container(100). A counter electrode and a supplying electrode face each other inside the processing container. The counter electrode and the supplying electrode form a plasma generation space. A high frequency power(150) is connected to the supplying electrode and outputs the high frequency power into the supplying electrode. At least one of the counter electrode(105) and the supplying electrode(110) includes the base material formed with metal and the dielectric substance inserted in the base material. |
