| 摘要 |
PURPOSE: A bake unit of a track system and a method for performing a photolithography process are provided to improve uniformity of a CD in a pattern formed on a wafer. CONSTITUTION: A bake chamber(201) has a sealed space and receives a wafer so as to perform a baking process. Temperature sensors (210,214,216,218) are installed within the bake chamber so as to correspond to different parts of the received wafer. Each of the temperature sensors senses individually the different parts of the wafer. A temperature adjustment coil is installed in the inside of the bake chamber so as to heat individually the different parts of the wafer.
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