| 摘要 |
PURPOSE: A method for forming a pattern to prevent crosstalk in an image sensor is provided to prevent a light not condensed by a micro lens from being scattered at the boundary of a color filter, by forming an additional metal wiring with a cross pattern on the top of a first and a second metal wiring formed between a photo diode and the color filter. CONSTITUTION: A first and a second metal wiring(100,102) are formed in an inter-layer insulation film on a semiconductor substrate. A photo diode is formed on the semiconductor substrate. A third metal wiring(208) with a cross pattern is formed on the semiconductor substrate. The third metal wiring crosses across the center of the first and the second metal wiring. A color filter(104,106,108) is formed on the center of the cross pattern of the third metal wiring. A micro lens is formed to correspond to the color filter. The micro lens is formed on the semiconductor substrate of the color filter.
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