| 摘要 |
PURPOSE: A method for manufacturing an image sensor is provided to form a zero-gap micro lens, by using a simple process. CONSTITUTION: A substrate(100) having a pixel region and a logic circuit region is prepared. An interlayer insulation film(140) having a trench(T) is formed on a region corresponding to the pixel region of the substrate. A planarized film is formed by burying the trench. A valley is formed to partition the formation region of a micro lens on the planarized film. A first micro lens pattern is formed on the formation region of the micro lens. A second micro lens pattern(300) is formed by etching the planarized film using the formation region of the micro lens as an etching mask.
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