发明名称 A METHOD OF FORMING A MASK PATTERN
摘要 <p>PURPOSE: A method for forming a mask pattern is provided to prevent a bridge by inserting a scattering bar reducing pattern density. CONSTITUTION: A pattern is designed. The pattern has first light shielding pads and second light shielding pads(422,424). The second light shielding pads are formed in a space among the first light shielding pads. At least one scattering bar(420) is inserted into the inside of the first light shielding pads. Pattern density is reduced.</p>
申请公布号 KR20110076229(A) 申请公布日期 2011.07.06
申请号 KR20090132880 申请日期 2009.12.29
申请人 DONGBU HITEK CO., LTD. 发明人 CHOI, JAE YOUNG
分类号 H01L21/027 主分类号 H01L21/027
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