发明名称
摘要 A semiconductor device includes a semiconductor substrate having a principal plane on which gate, source, and drain electrodes are located. A film made of a polymer with a low dielectric constant is over the gate and drain electrodes to insulate the gate and drain electrodes from the source electrodes. A chip surface electrode located over the low-dielectric-constant polymer film and the source electrode, and connected to ground potential. The source electrode is provided with the ground potential through the chip surface electrode.
申请公布号 JP4718751(B2) 申请公布日期 2011.07.06
申请号 JP20020352573 申请日期 2002.12.04
申请人 发明人
分类号 H01L23/48;H01L29/417;H01L23/31;H01L23/367;H01L23/482;H01L25/07;H01L25/18 主分类号 H01L23/48
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