发明名称 EXPOSURE APPARATUS AND METHOD OF CHANGING MASK IN THE EXPOSURE APPARATUS
摘要 <p>PURPOSE: An exposure apparatus and a method for exchanging a mask of an exposure apparatus are provided to improve operating efficiency of equipment by largely shortening a time for exchanging a mask. CONSTITUTION: An exposure body comprises a light source unit(110), a buffer unit(130) arranged on a light irradiation path for transferring a pattern mask, and a buffer unit(130) for temporarily receiving the pattern mask transferred from the stage unit. The pattern mask to be exchanged is stored in a mask library unit(200). An exposure apparatus transfers the pattern mask to the stage unit. The exposure apparatus includes a robot unit for transferring the pattern mask to the mask library unit.</p>
申请公布号 KR20110075284(A) 申请公布日期 2011.07.06
申请号 KR20090131700 申请日期 2009.12.28
申请人 LG ELECTRONICS INC. 发明人 SHIN, YOUNG HOON;LEE, IN HO;LEE, TAE HO;SONG, KI HYUN
分类号 H01L21/027;H01L21/677 主分类号 H01L21/027
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