发明名称 |
EXPOSURE APPARATUS AND METHOD OF CHANGING MASK IN THE EXPOSURE APPARATUS |
摘要 |
<p>PURPOSE: An exposure apparatus and a method for exchanging a mask of an exposure apparatus are provided to improve operating efficiency of equipment by largely shortening a time for exchanging a mask. CONSTITUTION: An exposure body comprises a light source unit(110), a buffer unit(130) arranged on a light irradiation path for transferring a pattern mask, and a buffer unit(130) for temporarily receiving the pattern mask transferred from the stage unit. The pattern mask to be exchanged is stored in a mask library unit(200). An exposure apparatus transfers the pattern mask to the stage unit. The exposure apparatus includes a robot unit for transferring the pattern mask to the mask library unit.</p> |
申请公布号 |
KR20110075284(A) |
申请公布日期 |
2011.07.06 |
申请号 |
KR20090131700 |
申请日期 |
2009.12.28 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
SHIN, YOUNG HOON;LEE, IN HO;LEE, TAE HO;SONG, KI HYUN |
分类号 |
H01L21/027;H01L21/677 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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