| 摘要 |
PURPOSE: A plasma processing apparatus is provided to adjust distribution of plasma concentration. CONSTITUTION: An antenna includes a plurality of antenna members which are laterally arranged to each other. A high frequency power supply unit(6) supplies high frequency power to an antenna. A power conductive path(61) is formed to connect one end of the antenna to the high frequency power supply unit. A dielectric window member(32) is prepared between a loading plate and the antenna so as to divide the processing atmosphere.
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