发明名称 SUBSTRATE PROCESSING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing method and apparatus, capable of determining the number of nano bubbles to process a substrate, when producing the nano bubbles in a liquid containing the nano bubbles and supplying the liquid to the substrate. SOLUTION: Standard particles whose diameters are previously determined are mixed with a mixing liquid 81. The number of the standard particles per the unit volume of the mixing liquid mixed with the standard particles is measured by a counter 86. An amount of a reference liquid containing the number of the standard particles to be supplied is put into a liquid L containing the nano bubbles NB, the reference liquid being the mixing liquid 81. The particle size distribution F1 of the standard particles and the particle size distribution F2 of the nano bubbles in the liquid containing the nano bubbles are determined using a particle size distribution measuring instrument 100. Using as a reference the number of the standard particles corresponding to the peak value P1 of the particle size distribution F1 of the standard particles in the liquid L containing the nano bubbles, the number of the nano bubbles corresponding to the peak values P2, P3 and P4 of the particle size distribution F2 of the nano bubbles is determined. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011129743(A) 申请公布日期 2011.06.30
申请号 JP20090287374 申请日期 2009.12.18
申请人 SHIBAURA MECHATRONICS CORP 发明人 HIROSE HARUMICHI;ABE MASAYASU;NISHIBE YUKINOBU;KIKUCHI TSUTOMU;ANDO YOSHIHIRO
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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