| 摘要 |
The semiconductor structure of the present invention comprises: a P-well, a first N+ diffusion region, a first P+ diffusion region, a second P+ diffusion region, a first N-well, and a second N+ diffusion region. The semiconductor structure of the present invention comprises: a N-well, a first P+ diffusion region, a first N+ diffusion region, a second N+ diffusion region, a first P-well, and a second P+ diffusion region. Compared with the conventional semiconductor structure for realizing an ESD protection circuit, the semiconductor structure of the present invention requires a smaller area by utilizing the parasitic BJT to have the same ESD protection function. Brief summarized, the semiconductor structure disclosed by the present invention can be utilized for realizing an ESD protection circuit in a smaller area to reduce cost.
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