| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve lithographic imaging at low k<SB>1</SB>values. <P>SOLUTION: Improved low k<SB>1</SB>lithographic imaging is disclosed by optimizing or improving an illumination polarization condition. The polarization condition can be a pre-defined spatially varying polarization, or a spatially customized local polarization of bright illumination points based on tracking a value of a desired lithographic response. Several non-traditional polarization conditions, e.g., TM/TE polarization (with or without a central TM region), diagonal polarization, and Y+X polarization (typically used for dark field illumination) are disclosed, and that offer substantial imaging advantages for specific lithographic problems, especially at low k<SB>1</SB>values. The initial polarization condition may be limited to specific fixed polarization angles. The fixed polarization angles are represented by achievement by hardware. <P>COPYRIGHT: (C)2011,JPO&INPIT |
