发明名称 SUBSTRATE PROCESSING APPARATUS AND METHOD
摘要 PROBLEM TO BE SOLVED: To provide a compact apparatus for processing a substrate, along with a method of processing the substrate, capable of processing the substrate by efficiently producing liquid containing nano-bubbles which are minute air bubbles and supplying the liquid to the substrate. SOLUTION: The substrate processing apparatus 1 includes a container 30 which is open upward, able to accommodate a liquid, divided into a first container section 41 and a second container section 42, and has at the bottom a passage 49 which allows the liquid to move from the first container section 41 to the second container section 42, a minute air bubble producing unit 40 which is disposed in the liquid L in the first container section 41 and mixes gas in the liquid L to produce the liquid L containing minute air bubbles in the first container section 41, and a pump 35 which moves the liquid L containing minute air bubbles in the first container section 41 through the passage 49 at the bottom into the second container section 42 and transfers the liquid L containing minute air bubbles from the second container section 42 to a substrate W. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011129741(A) 申请公布日期 2011.06.30
申请号 JP20090287371 申请日期 2009.12.18
申请人 SHIBAURA MECHATRONICS CORP 发明人 HIROSE HARUMICHI;TAKEISHI KOJI;MIYAMOTO TAKASHI;WATANABE SHIGERU;SAKAI TETSUYA;INOMATA SAIKO
分类号 H01L21/304;H01L21/027;H01L21/306 主分类号 H01L21/304
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