| 摘要 |
<p>A charged particle beam system includes a main chamber, an exchange chamber, an x-y positioning stage housed in the main chamber, a substrate-supporting structure (13') supported by or provided by said stage and moveable in first and second perpendicular directions of travel between limits which define a field of travel; and a substrate handling device (141) housed inside the main chamber for loading and unloading a substrate into and out of the main chamber, the device comprising a bar (17) and a side member (18'), the substrate handling device configured to translate the bar along its longitudinal axis parallel to the first direction of travel and the side member extending laterally from the bar, parallel to the second direction, for supporting the substrate to one side of the bar. The substrate - supporting structure has a loading/unloading position (27) at a limit of travel along the first direction and a limit of travel along the second direction, wherein the substrate-supporting structure and the substrate handling device are positioned so that the substrate can be lifted up from and set down on the substrate-supporting structure when the substrate-supporting structure is in the loading/unloading position and when the side member is in a loading/unloading position. The substrate - supporting structure and/or a substrate supported by the substrate - supporting structure has a part which is closest to the limit of travel in the second direction and which defines a line (35') extending along the second direction which is the limit of extent of the part towards the limit of travel in the first direction, wherein the side member is shaped so that, when it is in its loading/unloading position lies, it does not cross the line, whereby the substrate- supporting structure is free to move in the second direction without the side member interfering with the substrate - supporting structure and/or a substrate.</p> |
