METHOD FOR FORMING A TRANSPARENT CONDUCTIVE FILM FOR A FLEXIBLE SUBSTRATE USING LOW-TEMPERATURE AND SELECTIVE ATOMIC LAYER FORMING PROCESS

摘要

PURPOSE: A method for forming a transparent conductive film for a flexible substrate using a low-temperature and a selective atomic layer forming process is provided to form a AZO transparent oxide conductive film suitable for a flexible substrate through a selective deposition of ALD(Atomic Layer Deposition) under low temperature. CONSTITUTION: A hydrophobic material(102) is coated on a substrate(101). A desired shadow mask(103) is arranged in the hydrophobic film substrate in which the hydrophobic material is coated. The ultraviolet ray is projected selectively on the hydrophobic film substrate to be changed into a hydrophilic film substrate(102a). An AZO transparent is formed by processing an ALD(Atomic Layer Deposition) on the hydrophilic film substrate The AZO transparent has average visible ray transmission over 90% and resistance less than 100Ω / cm^2.