发明名称 PLATING APPARATUS OF CONTINUOUS VERTICAL CONVEYANCE TYPE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plating apparatus capable of plating even the upper part of a workpiece near the level of a plating liquid in a plating film thickness uniform over the other part of the workpiece in the plating apparatus of continuous vertical conveyance type. <P>SOLUTION: In the plating apparatus of continuous vertical conveyance type capable of continuously conveying and plating the workpiece W of flat plate shape in a vertical posture, auxiliary anode electrodes 9 are disposed on positions opposing upper parts of both surfaces of the workpiece W in parallel to the workpiece W and the level of the plating liquid such that the auxiliary anode electrodes 9 are connected with a plus pole of an auxiliary direct current electric power source device and the minus pole of the auxiliary direct current electric power source device is connected with the workpiece W, and an output current of the auxiliary direct current electric power source device is set to be 1% to 10% of the plating current flowing from anodes 8, 8 to the workpiece W. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011127193(A) 申请公布日期 2011.06.30
申请号 JP20090287777 申请日期 2009.12.18
申请人 CHUO SEISAKUSHO LTD 发明人 OZAKI TAKASHI;HOTTA HIROMITSU
分类号 C25D17/10;C25D21/12 主分类号 C25D17/10
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