| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt for an acid generator of a resist composition which can form patterns having excellent resolution. <P>SOLUTION: There is provided the salt represented by formula (I). In formula (I), Q<SP>1</SP>and Q<SP>2</SP>are F or a 1 to 6C perfluoroalkyl group; L<SP>1</SP>is a 1 to 17C alkylene group, -CH<SB>2</SB>- contained in the alkylene group may be replaced by -O- or -CO-; L<SP>2</SP>is a single bond or -O-(CH<SB>2</SB>)<SB>I</SB>-CO-; -CH<SB>2</SB>- contained in -(CH<SB>2</SB>)<SB>I</SB>- may be replaced by -O-; l is an integer of 1 to 6; ring W<SP>1</SP>is a 4 to 36C lactone ring; R<SP>3</SP>is a 1 to 6C alkyl or a 1 to 6C alkoxy; t is an integer of 0 to 2; R<SP>1</SP>is a 1 to 12C hydrocarbon group; ring W<SP>2</SP>is a 3 to 36C saturated hydrocarbon ring; R<SP>2</SP>is a 1 to 6C alkyl or a 1 to 6C alkoxy; s is an integer of 0 to 2; and Z<SP>+</SP>is an organic counter ion. <P>COPYRIGHT: (C)2011,JPO&INPIT |
