| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt for an acid generator of a resist composition which can form patterns having excellent resolution and CD uniformity. <P>SOLUTION: There is provided the salt represented by formula (I). In formula (I), Q<SP>1</SP>and Q<SP>2</SP>are each F or a 1 to 6C perfluoroalkyl group; L<SP>1</SP>and L<SP>2</SP>are each a 1 to 17C alkylene group, -CH<SB>2</SB>- contained in the alkylene group may be replaced by -O- or -CO-; ring W<SP>1</SP>is a 3 to 36C saturated hydrocarbon ring; v is an integer of 1 or 2; R<SP>5</SP>is a 1 to 6C alkyl or a 1 to 6C alkoxy; w is an integer of 0 to 2; ring W<SP>2</SP>is a 3 to 36C saturated hydrocarbon ring; R<SP>1</SP>is a 1 to 12C hydrocarbon group; R<SP>2</SP>is a 1 to 6C alkyl or a 1 to 6C alkoxy; s is an integer of 0 to 2; Z<SP>+</SP>is an organic counter ion. <P>COPYRIGHT: (C)2011,JPO&INPIT |
