| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus capable of attaching a substrate holder to a wafer substrate and conveying them while suppressing production of particles. <P>SOLUTION: The charged particle beam lithography apparatus 100 includes the substrate holder 20 which has a plurality of plate members and uses the plurality of plate members to hold the wafer substrate therebetween without fixing it, a lithography chamber 103 in which the substrate holder is carried in the state wherein the wafer substrate is held without being fixed, a support pin 106 which holds a lower surface of the substrate holder carried in the lithography chamber, and can be elevated, a stationary block member 108 which comes into contact with an upper surface of the substrate holder as the support pin 106 is elevated to stop a holding portion from moving up, and fixes the wafer substrate in the substrate holder with pressing force of the holding portion from below and repulsion against the pressing force, and a lithography portion 150 which draws a pattern on the wafer substrate, fixed in the substrate holder with the support pin 106 and stationary block member 108, using an electron beam. <P>COPYRIGHT: (C)2011,JPO&INPIT |
