发明名称 |
FILM FORMING APPARATUS AND FILM FORMING METHOD |
摘要 |
The present invention provides a film forming apparatus and a film forming method realizing improvement in the degree of freedom in film formation while suppressing production cost. While conveying a base material by using a plurality of guide rolls, film formation is performed by atomic layer deposition by outputting precursor gases to the base material by a plurality of ALD heads. The ALD heads are disposed so as to individually face the guide rolls so that the precursor gases are locally output to the base material. The amount of the precursor gases used is reduced more than that in a related art, and the variety of kinds of the usable precursor gases is widened. |
申请公布号 |
US2011159186(A1) |
申请公布日期 |
2011.06.30 |
申请号 |
US20100975492 |
申请日期 |
2010.12.22 |
申请人 |
SONY CORPORATION |
发明人 |
CHAKCHUNG YU ANDREW;KAWANA TAKAHIRO;HONDA HIDETOSHI;ONODERA SEIICHI;KANNO YOHEI |
分类号 |
C23C16/458;C23C16/00;C23C16/44 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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