MASKLESS EXPOSURE APPARATUS AND CONTROL METHOD THEREOF

摘要

PURPOSE: A maskless exposure apparatus and a control method thereof are provided to rapidly obtain the strength, center position, and focusing of a multi-beam by including an optical measurement instrument having a photo sensor and an image sensor. CONSTITUTION: A table(12) is supported by four leg members(12a). A stage(14) is arranged in the guide(30) on the table in Y-axis direction. A photosensitive material(11) is on the stage. A frame(22) of a gate shape is combined at the center of the stage. Two position detecting sensors(24) are installed in the left side of the frame.