| 摘要 |
<p>Provided is a substrate processing device in which movement of floating mist between processing tanks is suppressed. A substrate processing device (100) for processing a substrate (20) is provided with: a first processing tank (10A) which includes a conveying roller (32) that can convey the substrate (20); and a second processing tank (10B) which is linked to the first processing tank (10A). The conveying roller (32) extends to and is present in the second processing tank (10B), a pair of liquid-removing curtain devices (15A, 15B) are disposed in a boundary region (60) between the first processing tank (10A) and the second processing tank (10B), and at least one of the conveying rollers (30) disposed between the pair of liquid-removing curtain devices (15A, 15B) has air blow holes (35) formed at both ends (36) of a conveying shaft (34).</p> |
