发明名称 SUBSTRATE COVER AND CHARGED PARTICLE BEAM WRITING METHOD USING SAME
摘要 A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.
申请公布号 US2011155930(A1) 申请公布日期 2011.06.30
申请号 US20100970084 申请日期 2010.12.16
申请人 NUFLARE TECHNOLOGY, INC.;KABUSHIKI KAISHA TOSHIBA 发明人 KAWAGUCHI MICHIHIRO;YAMAGUCHI KEISUKE;KANEZAWA SHUN;MITSUI SOICHIRO;AKENO KIMINOBU
分类号 G21K5/10 主分类号 G21K5/10
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