| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrode plate for a plasma processing apparatus that improves in-plane uniformity of plasma processing and facilitates replacement of an upper electrode having been consumed. SOLUTION: The electrode plate 3 for the plasma processing apparatus is constituted by stacking a plurality of electrode constitution plates and providing a plurality of gas passing holes 11 penetrating the electrode constitution plates along a thickness is provided with a gap portion s1 formed of a plurality of grooved recesses 32A to 32E, avoiding the gas passing holes 11, at an outer circumferential portion between adjacent electrode constitution plate 3a and 3b, wherein the gap portion s1 is provided so as to be open on outer circumferential surfaces of the electrode constitution plates 3a, and both the electrode constitution plates 3a and 3b are smaller in contact area per unit area at the outer circumferential portion of the electrode plate 3 than at a center portion thereof. COPYRIGHT: (C)2011,JPO&INPIT
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