发明名称 |
METHODS FOR REDUCING THE DEPOSITION OF SILICON ON REACTOR WALLS USING PERIPHERAL SILICON TETRACHLORIDE |
摘要 |
Fluidized bed reactor systems and distributors are disclosed as well as processes for producing polycrystalline silicon from a thermally decomposable silicon compound such as trichlorosilane. The processes generally involve reduction of silicon deposits on reactor walls during polycrystalline silicon production by use of a silicon tetrahalide. |
申请公布号 |
US2011158888(A1) |
申请公布日期 |
2011.06.30 |
申请号 |
US20100977739 |
申请日期 |
2010.12.23 |
申请人 |
MEMC ELECTRONIC MATERIALS, INC. |
发明人 |
ERK HENRY F. |
分类号 |
C01B33/02 |
主分类号 |
C01B33/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|