ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

摘要

Microlithographic projection exposure apparatus comprising an illumination device and ex projection objective), wherein, during the operation of the projection exposure apparatus, the illumination device an least partly illuminates a reticle in an object plane or the projection objective and the projection objective images this illuminated part of this object plane with a scale M onto at least one part of the wafer in the image plane, and wherein the wafer can be moved synchronously with the reticle perpendicular to the optical axis and providing a fly' s eye condenser for illuminating a plane.