发明名称 METHOD AND APPARATUS FOR MANUFACTURING ANTIREFLECTION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide an efficient method of manufacturing an antireflection film which does not cause a defect in an antireflection layer having a fine rugged structure and to provide a manufacturing apparatus. <P>SOLUTION: An exclusive pallet including a guide member for mounting a forming stamper at a prescribed position by abutting it to at least three sides of the forming stamper, has following steps in the described order. A step (A) for mounting the forming stamper; a step (B) for mounting an ionizing radiation curable resin along a side of the forming stamper; a step (C) for mounting a base material film on the forming stamper; a step (D) for extending the ionizing radiation curable resin over the whole face of the forming stamper without spilling the resin out of the forming stamper by pressing a pressurizing member on the base material film on the ionized radiation curing resin and moving it; a step (E) for curing the ionizing radiation curable resin by irradiating it with the ionized radiation from the base material film side; and a step (F) for peeling off an integral body of the ionizing radiation curable resin after cured and the base material film from the forming stamper. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011128395(A) 申请公布日期 2011.06.30
申请号 JP20090287222 申请日期 2009.12.18
申请人 DAINIPPON PRINTING CO LTD 发明人 NAKAGAWA HIROKI;MATSUMOTO KAZUYUKI
分类号 G02B1/11 主分类号 G02B1/11
代理机构 代理人
主权项
地址