发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING ANTIREFLECTION FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an efficient method of manufacturing an antireflection film which does not cause a defect in an antireflection layer having a fine rugged structure and to provide a manufacturing apparatus. <P>SOLUTION: An exclusive pallet including a guide member for mounting a forming stamper at a prescribed position by abutting it to at least three sides of the forming stamper, has following steps in the described order. A step (A) for mounting the forming stamper; a step (B) for mounting an ionizing radiation curable resin along a side of the forming stamper; a step (C) for mounting a base material film on the forming stamper; a step (D) for extending the ionizing radiation curable resin over the whole face of the forming stamper without spilling the resin out of the forming stamper by pressing a pressurizing member on the base material film on the ionized radiation curing resin and moving it; a step (E) for curing the ionizing radiation curable resin by irradiating it with the ionized radiation from the base material film side; and a step (F) for peeling off an integral body of the ionizing radiation curable resin after cured and the base material film from the forming stamper. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011128395(A) |
申请公布日期 |
2011.06.30 |
申请号 |
JP20090287222 |
申请日期 |
2009.12.18 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
NAKAGAWA HIROKI;MATSUMOTO KAZUYUKI |
分类号 |
G02B1/11 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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