PHOTOMASK

摘要

A photomask is provided with: a mask substrate (2) comprising a transparent substrate (4) with a plurality of mask patterns (5) of a prescribed shape formed on the lower surface (4a); and a micro-lens array (3) comprising a different transparent substrate (9), a plurality of projection lenses (10) which projects a reduced projection image of the plurality of mask patterns (5) onto an oppositely arranged object to be exposed and is formed on the lower surface (9a), and a plurality of field lenses (11) which focuses the incident light onto the projection lens (10) and is formed on the upper surface (9b) such that the optical axis thereof matches the optical axis of projection lens (10). The photomask is formed by connecting the mask substrate (2) with the micro-lens array (3) in a state wherein the mask patterns (5) and the field lenses (11) are in close proximity and opposite each other with a predetermined gap therebetween. In this manner, the photomask improves the usage efficiency of the light irradiated onto the object to be exposed.