<p>PURPOSE: A transistor is provided to prevent etching issue, lack of uniformity, and a leakage current by increasing threshold voltage through an insertion layer between a source electrode and a channel layer. CONSTITUTION: In a transistor, a channel layer(C1) including an oxide semiconductor is formed on a substrate(SUB1). A gate electrode(G1) is formed on the channel layer. A source electrode(S1) and a drain electrode(D1) are respectively contacted with both ends of the channel layer. A semiconductor insertion layer(A1) is formed between the source electrode and the channel layer. A potential barrier between the source electrode and the channel layer is increased by the semiconductor insertion layer.</p>
申请公布号
KR20110074355(A)
申请公布日期
2011.06.30
申请号
KR20090131292
申请日期
2009.12.24
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
JEON, SANG HUN;SONG, I HUN;KIM, CHANG JUNG;PARK, SUNG HO