METHOD FOR PREPARING BARRIER FILM FOR PLASTIC SUBSTRATE BY USING LOW FREQUENCY PLASMA ENHANCED ATOMIC LAYER DEPOSITION

摘要

PURPOSE: A method of manufacturing a barrier film for a plastic substrate using low frequency PEALD equipment is provided to ensure low WVTR transparency of at least 0.004g/m2day since an aluminum oxide film is formed on the top of a plastic film and thus the transparency prevention property of gas is enhanced. CONSTITUTION: A method of manufacturing a barrier film for a plastic substrate using low frequency PEALD equipment comprises next steps. The plastic substrate is guided into plasma atomic-layer deposition device to introduce reaction gas. A source material is introduced into a reaction container and an adsorption layer is formed on the top of the substrate. An aluminum oxide layer is formed on the top by repeating of the step of purging source material and by-product remaining the reaction container, 10~400 times. Low frequency plasma is applied during at least a part of the steps.