| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an ion beam source which can be used even for deposition of an insulating material without forming an arc discharge caused by rapid electrification due to positive ion flow made incident to a target surface. <P>SOLUTION: The ion beam source used together with a non-conductive target is composed of grids 1 to 4 which extract ions, and a power source (DC power source 16 and beam control device 17) which supplies pulse power to these grids. The power source includes: power sources for a grid 1 to a grid 3, respectively; a set 19 of switches which connect and cut-off the supply of powers to the grids; a power switching device 21 to control these switches; and a pulse generator 20 in order to carry out switching of the switches. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
